SCHEMBL13779647

SCHEMBL13779647

CC1(OC(=O)CCl)CC2CCC1C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL119735 0.85 HSD11B1 (0.32) HSD11B1
SCHEMBL17322538 0.85 ALOX5AP (0.33) HSD11B1
SCHEMBL14982576 0.84 HSD11B1 (0.31) HSD11B1
SCHEMBL18744851 0.84 HSD11B1 (0.31) HSD11B1
SCHEMBL13564204 0.84 HSD11B1 (0.31) HSD11B1
SCHEMBL4862977 0.84 HSD11B1 (0.31) HSD11B1
SCHEMBL14476933 0.83 ALDH1A1 (0.34) HSD11B1
SCHEMBL17320564 0.83 ALOX5AP (0.31) HSD11B1
SCHEMBL26939201 0.83 HSD11B1 (0.36) HSD11B1
SCHEMBL15355112 0.81 HSD11B1 (0.30) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020233550-A1 SULFONIUM SALT-BASED MONOMOLECULAR RESIN ACID GENERATOR AND PHOTORESIST COMPOSITION THEREOF 中国科学院理化技术研究所 (CN) 2020-11-26 WO disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed