Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL119735 | 0.85 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL17322538 | 0.85 | ALOX5AP (0.33) | HSD11B1 | |
| SCHEMBL14982576 | 0.84 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL18744851 | 0.84 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL13779647 | 0.84 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL13564204 | 0.84 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL14476933 | 0.83 | ALDH1A1 (0.34) | HSD11B1 | |
| SCHEMBL26939201 | 0.83 | HSD11B1 (0.36) | HSD11B1 | |
| SCHEMBL17320564 | 0.83 | ALOX5AP (0.31) | HSD11B1 | |
| SCHEMBL14982573 | 0.81 | HSD11B1 (0.30) | HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7351521-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-04-01 | — | — | US | disclosed |
| US-20070172762-A1 | Photoresist composition for deep ultraviolet lithography | DAMMEL RALPH R | 2007-07-26 | — | — | US | disclosed |
| US-20070154841-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2007-07-05 | — | — | US | disclosed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | disclosed |
| EP-1602011-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ Electronic Materials USA Corp. (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004074928-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-02 | — | — | WO | disclosed |
| US-20040166434-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | disclosed |
| US-20040166433-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | disclosed |