SCHEMBL13809147

SCHEMBL13809147

CC1CC2CCCC(C1)C2(C)OC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4896346 0.71 CYP17A1 (0.35)
SCHEMBL19135894 0.68 OPRM1 (0.32)
SCHEMBL3103307 0.60
SCHEMBL24618702 0.58 ADH1C (0.31)
SCHEMBL9813694 0.58 ABCB1 (0.36)
Ammonia Solution, Strong SCHEMBL11222759 0.58 MAPT (0.31)
SCHEMBL4897293 0.58
SCHEMBL12166897 0.57 MCHR1 (0.32)
SCHEMBL633120 0.57 MCHR1 (0.32)
SCHEMBL12438852 0.57 MCHR1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1783148-B1 HIGH-MOLECULAR COMPOUND, ACID GENERATOR, POSITIVE RESIST COMPOSITIONS, AND METHOD FOR FORMATION OF RESIST PATTERNS TOKYO OHKA KOGYO CO LTD (JP) 2009-06-10 EP disclosed