Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | INPPL1 | O15357 | 1/20 | 0.33 |
| ▸ | INPP5B | P32019 | 1/20 | 0.33 |
| ▸ | INPP5A | Q14642 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15800985 | 0.81 | GABRA1 (0.39) | — | |
| SCHEMBL17469707 | 0.80 | CA1 (0.38) | — | |
| SCHEMBL17238846 | 0.80 | SMN1; SMN2 (0.45) | — | |
| SCHEMBL28235770 | 0.73 | LMNA (0.52) | — | |
| SCHEMBL19656058 | 0.72 | CES2 (0.37) | — | |
| SCHEMBL14636104 | 0.72 | — | — | |
| SCHEMBL27531256 | 0.72 | RHEB (0.43) | — | |
| SCHEMBL27419147 | 0.70 | TOP1 (0.36) | — | |
| Water SCHEMBL27847397 | 0.70 | ALDH1A1 (0.46) | — | |
| SCHEMBL27881181 | 0.70 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8541063-B2 | Undercoat solution, ink-jet recording method and ink-jet recording device | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541063-B2 | Undercoat solution, ink-jet recording method and ink-jet recording device | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8420714-B2 | Ink composition, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8420714-B2 | Ink composition, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8309629-B2 | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate | FUJIFILM CORPORATION (JP) | 2012-11-13 | — | — | US | disclosed |
| US-8240808-B2 | Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8192803-B2 | Applying an undercoating liquid of a polymer onto a recording medium; partially curing the undercoating liquid; ejecting an ink that is curable by irradiation with actinic energy onto the undercoating liquid | FUJIFILM CORPORATION (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8173226-B2 | Polymerizable compound , polyethylene glycol mono(meth)acrylate, a polystyrene oligomer having a methacryloyl group at one terminal, acrylic macromonomer imides | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8061830-B2 | Ink-jet recording ink set and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2011-11-22 | — | — | US | disclosed |
| US-8039542-B2 | Pigment dispersion and ink composition using the same | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| US-7267925-B2 | Photosensitive composition and novel compound used therefor | FUJIFILM CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-20070206045-A1 | Ink-jet recording ink set and ink-jet recording method | FUJI PHOTO FILM CO., LTD. (JP) | 2007-09-06 | — | — | US | disclosed |
| US-7217493-B2 | acid-decomposable group-containing polysiloxane or polysilsesquioxane and a specific amount of an acid generator that generates a sulfonic acid, and an organic base; high sensitivity, high resolution and good line edge roughness | FUJIFILM CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| EP-1770441-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| US-20070072121-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| EP-1755000-A2 | Positive resist composition and a pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-7169697-B2 | Semiconductor device and manufacturing method of the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169529-B2 | Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070015087-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-18 | — | — | US | disclosed |