SCHEMBL13829346

SCHEMBL13829346

CCC(C)(C)C(=O)ON1C(=O)C2C3C=CC(C3)C2C1=O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2C19 P33261 1/20 0.45
SMN1; SMN2 Q16637 7/20 0.45
PKM P14618 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.44
TDP1 Q9NUW8 2/20 0.44
RAB9A P51151 2/20 0.43
MAPK1 P28482 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
TSHR P16473 3/20 0.40
HTT P42858 2/20 0.40
USP2 O75604 1/20 0.40
HSD17B10 Q99714 1/20 0.40
POLB P06746 2/20 0.39
CTDSP1 Q9GZU7 1/20 0.39
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26085422 0.85 ALDH1A1 (0.49) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL23686440 0.82 ALDH1A1 (0.46) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL107824 0.81 L3MBTL1 (0.44) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL23686298 0.80 KMT2A (0.48) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL23686310 0.80 SMN1; SMN2 (0.42) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL13473169 0.79 ALDH1A1 (0.49) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL20099725 0.79 ALDH1A1 (0.49) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL23686300 0.78 MEN1 (0.43) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL1006031 0.77 ALDH1A1 (0.53) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2
SCHEMBL9250588 0.77 ALDH1A1 (0.46) ALDH1A1CYP1A2CYP3A4CYP2C19SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11780946-B2 Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-10 US disclosed
US-8808965-B2 Pattern forming method, pattern, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-20120288691-A1 PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-11-15 US disclosed