Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 6/20 | 0.36 |
| ▸ | FDFT1 | P37268 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.33 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23332998 | 0.85 | HSD11B1 (0.34) | HSD11B1FDFT1EPHX1EPHX2L3MBTL1 | |
| SCHEMBL13849147 | 0.83 | L3MBTL1 (0.36) | HSD11B1EPHX1EPHX2L3MBTL1ALDH1A1 | |
| SCHEMBL218470 | 0.82 | ALDH1A1 (0.41) | HSD11B1FDFT1EPHX1ALDH1A1SCN9A | |
| SCHEMBL16487733 | 0.81 | FKBP1A (0.36) | HSD11B1EPHX1EPHX2L3MBTL1SCN9A | |
| SCHEMBL15216856 | 0.81 | EPHX1 (0.36) | HSD11B1FDFT1EPHX1EPHX2L3MBTL1 | |
| SCHEMBL15279648 | 0.81 | HSD11B1 (0.35) | HSD11B1FDFT1EPHX1EPHX2L3MBTL1 | |
| SCHEMBL21413068 | 0.80 | L3MBTL1 (0.45) | HSD11B1FDFT1EPHX2L3MBTL1ALDH1A1 | |
| SCHEMBL10305878 | 0.79 | HSD11B1 (0.35) | HSD11B1FDFT1EPHX1EPHX2ALDH1A1 | |
| SCHEMBL13475391 | 0.79 | EPHX2 (0.33) | HSD11B1FDFT1EPHX1EPHX2L3MBTL1 | |
| SCHEMBL824291 | 0.78 | HSD11B1 (0.33) | HSD11B1EPHX2L3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20220214614-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-07-07 | — | — | US | disclosed |
| US-9897916-B2 | Compound, polymer compound, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| US-8114949-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8088875-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088875-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090226851-A1 | (METH)ACRYLATE, POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR1, WDR26, LBR | HSD11B1 1338/4885FDFT1 1764/4885EPHX1 2320/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | HSD11B1 666/4885FDFT1 1060/4885EPHX1 4265/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.