SCHEMBL13869867

SCHEMBL13869867

Cc1ccc(C2(c3ccc(CO)cc3)OC(=O)c3ccccc32)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.60
MAPT P10636 4/20 0.60
MEN1 O00255 2/20 0.60
KMT2A Q03164 2/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
TDP1 Q9NUW8 2/20 0.60
GPR55 Q9Y2T6 2/20 0.60
TP53 P04637 2/20 0.60
CYP3A4 P08684 2/20 0.60
ALOX15 P16050 2/20 0.60
ALDH1A1 P00352 1/20 0.60
ESR1 P03372 1/20 0.60
TYMS P04818 1/20 0.60
TSHR P16473 1/20 0.60
ESR2 Q92731 1/20 0.60
HSD17B10 Q99714 1/20 0.60
CFTR P13569 1/20 0.58
GOPC Q9HD26 1/20 0.58
POLB P06746 3/20 0.56
NPSR1 Q6W5P4 3/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL822834 0.88 CFTR (0.73) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL18161910 0.87 CFTR (0.59) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL12715937 0.84 LMNA (0.85) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL25457206 0.84 CFTR (0.55) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL25005560 0.83 CFTR (0.54) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL19010401 0.81 CFTR (0.63) LMNAMAPTMEN1KMT2ASMN1; SMN2
Phenolphthalein SCHEMBL676259 0.78 MAPT (0.85) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL16303127 0.76 LMNA (0.68) LMNAMAPTMEN1KMT2ASMN1; SMN2
Phenolphthalein SCHEMBL9755053 0.76 MAPT (0.93) LMNAMAPTMEN1KMT2ASMN1; SMN2
SCHEMBL13882161 0.76 CFTR (0.55) LMNAMAPTMEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7514199-B2 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2009-04-07 US disclosed
US-20070148586-A1 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2007-06-28 US disclosed