SCHEMBL13898967

SCHEMBL13898967

CCC1(OC(C)=O)CCOC(=O)C1

nearest known ligand 0.43

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
CYP2C9 P11712 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL446476 0.85 LMNA (0.39) LMNACYP2C9
SCHEMBL1896908 0.82 LMNA (0.39) LMNACYP2C9
SCHEMBL13899248 0.75 LMNA (0.52) LMNACYP2C9
SCHEMBL445090 0.74 LMNA (0.37) LMNACYP2C9
SCHEMBL3870907 0.73 ALDH1A1 (0.35) LMNACYP2C9
SCHEMBL15492447 0.72
SCHEMBL4368629 0.72 GABRP (0.37) LMNACYP2C9
SCHEMBL6726019 0.71 LMNA (0.37) LMNACYP2C9
SCHEMBL29793069 0.70
SCHEMBL13104282 0.69 ALDH1A1 (0.33) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7504195-B2 Photosensitive polymer and photoresist composition DONGJIN SEMICHEM CO., LTD. (KR) 2009-03-17 US disclosed
US-7504195-B2 Photosensitive polymer and photoresist composition DONGJIN SEMICHEM CO., LTD. (KR) 2009-03-17 US disclosed
US-20080057436-A1 PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-06 US disclosed
US-20080057436-A1 PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-06 US disclosed