Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.42 |
| ▸ | CES1 | P23141 | 1/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | CCR2 | P41597 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 2/20 | 0.38 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19367986 | 0.98 | SMN1; SMN2 (0.44) | SMN1; SMN2HSD17B10CES2CES1HSD11B1 | |
| SCHEMBL21099781 | 0.89 | RIPK1 (0.36) | SMN1; SMN2HSD17B10HSD11B1CCR2FKBP1A | |
| SCHEMBL21186856 | 0.89 | RIPK1 (0.36) | SMN1; SMN2HSD17B10HSD11B1CCR2FKBP1A | |
| SCHEMBL19223961 | 0.89 | RIPK1 (0.36) | SMN1; SMN2HSD17B10HSD11B1CCR2FKBP1A | |
| SCHEMBL21703733 | 0.83 | RIPK1 (0.33) | SMN1; SMN2HSD17B10HSD11B1CCR2FKBP1A | |
| SCHEMBL23251132 | 0.81 | CCR2 (0.42) | SMN1; SMN2HSD17B10CES2CES1HSD11B1 | |
| SCHEMBL12672198 | 0.81 | SMN1; SMN2 (0.41) | SMN1; SMN2HSD17B10CES2CES1HSD11B1 | |
| SCHEMBL19772908 | 0.78 | THRA (0.53) | — | |
| SCHEMBL22060690 | 0.77 | CES2 (0.50) | SMN1; SMN2HSD17B10CES2CES1HSD11B1 | |
| SCHEMBL13246768 | 0.77 | CES2 (0.50) | SMN1; SMN2HSD17B10CES2CES1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504194-B2 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-7504194-B2 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |