Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALPL | P05186 | 3/20 | 0.56 |
| ▸ | ALPI | P09923 | 3/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13813783 | 0.95 | CYP1A2 (0.50) | ALPLALPICYP1A2CYP3A4CYP2C9 | |
| SCHEMBL14802497 | 0.80 | KCNA3 (0.72) | CYP1A2CYP3A4CYP2C9CYP2C19KCNA3 | |
| SCHEMBL24523105 | 0.80 | KCNA3 (0.72) | CYP1A2CYP3A4CYP2C9CYP2C19KCNA3 | |
| SCHEMBL24237029 | 0.80 | KCNA3 (0.72) | CYP1A2CYP3A4CYP2C9CYP2C19KCNA3 | |
| SCHEMBL3913428 | 0.79 | ALPL (0.47) | ALPLALPI | |
| SCHEMBL14329533 | 0.79 | KCNA3 (0.74) | CYP1A2CYP3A4CYP2C9CYP2C19KCNA3 | |
| SCHEMBL22193184 | 0.79 | CA12 (0.52) | KCNA3CA12CA1CA9ALOX15 | |
| SCHEMBL13813784 | 0.77 | CA12 (0.52) | ALPLCYP1A2KCNA3CA12CA1 | |
| SCHEMBL13930284 | 0.76 | ALPL (0.46) | ALPLALPI | |
| SCHEMBL21043909 | 0.75 | ALDH1A1 (0.52) | CYP1A2CYP3A4CYP2C9CYP2C19KCNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090045552-A1 | Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same | IMAI GENJI | 2009-02-19 | — | — | US | disclosed |