Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL564565 | 1.00 | HSD11B1 (0.34) | HSD11B1CD81 | |
| Methacrylic Acid SCHEMBL4974078 | 0.94 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL1999510 | 0.87 | CD81 (0.33) | HSD11B1CD81 | |
| SCHEMBL6026604 | 0.84 | — | — | |
| SCHEMBL4399725 | 0.82 | HSD11B1 (0.32) | HSD11B1CD81 | |
| SCHEMBL4399721 | 0.82 | HSD11B1 (0.32) | HSD11B1CD81 | |
| SCHEMBL2217960 | 0.81 | HSD11B1 (0.33) | HSD11B1 | |
| SCHEMBL3962965 | 0.81 | HSD11B1 (0.41) | HSD11B1 | |
| SCHEMBL3962973 | 0.81 | HSD11B1 (0.41) | HSD11B1 | |
| SCHEMBL6026599 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | claimed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | claimed |
| WO-2009038635-A1 | PROCESS FOR PREPARING COMPOSITIONALLY UNIFORM COPOLYMERS | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2009-03-26 | — | — | WO | claimed |
| US-20090076230-A1 | Process for preparing compositionally uniform copolymers | DUPONT ELECTRONIC POLYMERS L.P. | 2009-03-19 | — | — | US | claimed |
| EP-0982628-B1 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2006-11-02 | — | — | EP | claimed |
| EP-1041442-B1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL CO (JP) | 2004-10-27 | — | — | EP | claimed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | claimed |
| EP-4588985-A1 | REACTIVE ADHESIVE TAPE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| EP-4588988-A1 | REACTIVE ADHESIVE TAPE, REACTIVE ADHESIVE TAPE SYSTEM, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| WO-2025132700-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025132699-A1 | METHOD FOR PRODUCING A MULTI-PHASE POLYMER SYSTEM | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025132698-A1 | METHOD FOR PRODUCING A MULTI-PHASE POLYMER SYSTEM | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| US-11982940-B2 | Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-05-14 | — | — | US | disclosed |
| US-20030104312-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-05 | — | — | US | disclosed |
| EP-1300727-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| EP-1296190-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20030039918-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-27 | — | — | US | disclosed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-20020055569-A1 | Process for producing poly (meth) acrylates having reduced metal content | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11982940-B2 | Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator | PPOX, CRY1, CYBA | HSD11B1 2433/4885CD81 1276/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.