Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 2/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1397128 | 0.87 | HSD11B1 (0.34) | CD81HSD11B1 | |
| SCHEMBL564565 | 0.87 | HSD11B1 (0.34) | CD81HSD11B1 | |
| SCHEMBL6026604 | 0.81 | — | — | |
| Methacrylic Acid SCHEMBL4974078 | 0.81 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL4399721 | 0.79 | HSD11B1 (0.32) | CD81HSD11B1 | |
| SCHEMBL4399725 | 0.79 | HSD11B1 (0.32) | CD81HSD11B1 | |
| SCHEMBL3962965 | 0.78 | HSD11B1 (0.41) | HSD11B1 | |
| SCHEMBL3962973 | 0.78 | HSD11B1 (0.41) | HSD11B1 | |
| SCHEMBL6026599 | 0.75 | — | — | |
| SCHEMBL701765 | 0.75 | CD81 (0.33) | CD81 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111683986-B | Composition for forming cured film, alignment material, and retardation material | 日产化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-115975155-A | Composition for forming cured film for alignment material, and retardation material | 日产化学株式会社 | 2023-04-18 | — | — | CN | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150010866-A1 | RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2015-01-08 | — | — | US | disclosed |
| US-8758978-B2 | Radiation-sensitive resin composition, resist pattern formation method, and polymer | JSR CORPORATION (JP) | 2014-06-24 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-8535871-B2 | Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer | JSR CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8440384-B2 | Compound, salt, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20120183902-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-7704669-B2 | Acrylic polymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20070269754-A1 | Acrylic Polymer and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | RER1, PRMT1, REV1 | CD81 1648/4885HSD11B1 3550/4885MEN1 807/4885 |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | CD81 665/4885HSD11B1 405/4885MEN1 1303/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.