Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.43 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.43 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.43 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.43 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.43 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.43 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17586285 | 0.92 | MAPK1 (0.36) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL137006 | 0.85 | MEN1 (0.44) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL15279336 | 0.85 | MEN1 (0.44) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL1854491 | 0.83 | SMN1; SMN2 (0.39) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL15153031 | 0.80 | SMN1; SMN2 (0.44) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL16540167 | 0.78 | MEN1 (0.39) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL27825281 | 0.77 | MEN1 (0.38) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| SCHEMBL16540165 | 0.77 | MEN1 (0.38) | MAPK1MEN1KMT2AGRIN2DGRIN3B | |
| Adamantane SCHEMBL135442 | 0.76 | HSD11B1 (0.43) | MAPK1MEN1KMT2AEPHX2HSD11B1 | |
| SCHEMBL6485726 | 0.76 | MAPK1 (0.38) | MAPK1MEN1KMT2AGRIN2DGRIN3B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 335 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11453734-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2022-09-27 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-11042094-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-06-22 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-10962884-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |