Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | ASGR1 | P07306 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | BTK | Q06187 | 1/20 | 0.32 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.31 |
| ▸ | CTSD | P07339 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8737769 | 0.86 | HDAC6 (0.39) | HSD11B1HDAC6NFKB1NFKB2RELA | |
| Adamantane SCHEMBL1849974 | 0.80 | HSD11B1 (0.32) | HSD11B1EPHX2 | |
| SCHEMBL23452708 | 0.77 | DGAT1 (0.43) | HDAC6HDAC1HDAC2DGAT1 | |
| SCHEMBL140072 | 0.76 | MAPK1 (0.44) | HSD11B1MEN1MAPK1KMT2AEPHX2 | |
| SCHEMBL23036780 | 0.75 | BTK (0.37) | HSD11B1CHRM2CHRM1CHRM3BTK | |
| SCHEMBL9873641 | 0.75 | HDAC6 (0.36) | HDAC6HDAC1HDAC2DGAT1CTSD | |
| SCHEMBL8098483 | 0.75 | HDAC6 (0.40) | HDAC6HDAC1HDAC2DGAT1CTSD | |
| SCHEMBL28676568 | 0.75 | HDAC6 (0.36) | HDAC6HDAC1HDAC2DGAT1CTSD | |
| SCHEMBL22143232 | 0.74 | HDAC6 (0.33) | HDAC6HDAC1HDAC2DGAT1 | |
| SCHEMBL27564333 | 0.74 | ALDH1A1 (0.38) | HDAC6HDAC1HDAC2DGAT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-11042094-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-06-22 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-10962884-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-20200166843-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID | JSR CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-20190258168-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2019-08-22 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |