Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.38 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.38 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.38 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.38 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.38 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.38 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1853052 | 0.87 | EPHX2 (0.37) | SMN1; SMN2ALDH1A1KMT2AMEN1GRIN2D | |
| SCHEMBL140072 | 0.83 | MAPK1 (0.44) | SMN1; SMN2ALDH1A1LMNAKMT2AMEN1 | |
| Adamantane SCHEMBL1849974 | 0.80 | HSD11B1 (0.32) | ALDH1A1HSD11B1EPHX2 | |
| SCHEMBL19088475 | 0.76 | — | — | |
| SCHEMBL17586285 | 0.75 | MAPK1 (0.36) | SMN1; SMN2ALDH1A1LMNAKMT2AMEN1 | |
| SCHEMBL13705971 | 0.75 | CYP17A1 (0.50) | ALDH1A1LMNAKMT2AMEN1TSHR | |
| SCHEMBL1849971 | 0.74 | EPHX2 (0.33) | ALDH1A1KMT2AMEN1HSD11B1MAPK1 | |
| SCHEMBL533823 | 0.73 | EPHX2 (0.44) | SMN1; SMN2ALDH1A1LMNAKMT2AMEN1 | |
| SCHEMBL26029277 | 0.72 | FABP4 (0.32) | — | |
| SCHEMBL15153031 | 0.71 | SMN1; SMN2 (0.44) | SMN1; SMN2ALDH1A1KMT2AMEN1GRIN2D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-9465291-B2 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-9459532-B2 | Radiation-sensitive resin composition, polymer and compound | JSR CORPORATION (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9323146-B2 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | JSR CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9304393-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| US-9229323-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9120288-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9120288-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9046765-B2 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| EP-2623558-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR Corporation (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130078432-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078432-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20110223537-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |
| EP-2325695-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RAD1, RER1, RPA1 | SMN1; SMN2 1552/4885ALDH1A1 806/4885LMNA 2536/4885 |
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | FRG1, FGFR1, IGF1R | SMN1; SMN2 3001/4885ALDH1A1 435/4885LMNA 1844/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.