SCHEMBL4647642

SCHEMBL4647642

c1cc(Sc2ccc(COCC3CS3)cc2)ccc1COCC1CS1

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33
NR1H2 P55055 1/20 0.31
NAAA Q02083 1/20 0.31
PTGIR P43119 1/20 0.31
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402763 0.89 TSHR (0.37) LMNANAAATSHR
SCHEMBL4648468 0.83 NAAA (0.43) LMNANAAATSHR
SCHEMBL4647770 0.83 LTA4H (0.37) LMNANAAATSHR
SCHEMBL2734450 0.79 TSHR (0.54) LMNANAAATSHR
SCHEMBL15794308 0.77 IDO1 (0.47)
SCHEMBL4646518 0.76 MMP2 (0.41) LMNA
SCHEMBL4649028 0.76 HPGD (0.38) NAAATSHR
SCHEMBL1403018 0.74 SMN1; SMN2 (0.35) LMNAPTGIRTSHR
SCHEMBL1402494 0.74 TSHR (0.37) LMNATSHR
SCHEMBL16709772 0.70 LMNA (0.48) LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed