SCHEMBL14029059

SCHEMBL14029059

CC1CN=C(CCC2=NCC(C)N2)N1

nearest known ligand 0.41

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
NISCH Q9Y2I1 3/20 0.41
ADRA2A P08913 5/20 0.36
ADRA2B P18089 1/20 0.34
ADRA2C P18825 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2844613 0.83 NISCH (0.34) NISCHADRA2A
SCHEMBL8367405 0.83
SCHEMBL855414 0.78 NISCH (0.36) NISCHADRA2AADRA2BADRA2C
Hydrochloric Acid SCHEMBL3882896 0.72 ADRA2A (0.33) NISCHADRA2A
SCHEMBL952799 0.71 HTR1D (0.54) NISCHADRA2AADRA2BADRA2C
SCHEMBL2632819 0.69
SCHEMBL23784767 0.68 ALDH1A1 (0.34) NISCH
SCHEMBL13049139 0.67
SCHEMBL20026331 0.64
SCHEMBL7758130 0.63 NISCH (0.39) NISCHADRA2AADRA2BADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439011-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
US-7439011-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
US-7419774-B2 Photothermographic material and method for processing the same FUJILFILM CORPORATION (JP) 2008-09-02 US disclosed
US-20070003887-A1 Photothermographic material RIKIO INOUE 2007-01-04 US disclosed
US-20070003887-A1 Photothermographic material RIKIO INOUE 2007-01-04 US disclosed