SCHEMBL14030918

SCHEMBL14030918

CCOC(C)Oc1ccccc1NC(=O)c1ccc(C(C)CC)cc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.54
▸ MEN1 O00255 3/20 0.54
▸ RAB9A P51151 3/20 0.54
▸ SMN1; SMN2 Q16637 3/20 0.49
▸ HTT P42858 2/20 0.49
▸ TSHR P16473 1/20 0.46
▸ NPC1 O15118 3/20 0.46
▸ GAA P10253 2/20 0.46
▸ PTK2 Q05397 1/20 0.46
▸ ALDH1A1 P00352 3/20 0.45
▸ HDAC1 Q13547 1/20 0.44
▸ KDM4E B2RXH2 2/20 0.43
▸ L3MBTL1 Q9Y468 1/20 0.43
▸ P4HTM Q9NXG6 1/20 0.43
▸ AHR P35869 1/20 0.43
▸ LMNA P02545 1/20 0.43
▸ POLB P06746 1/20 0.42
▸ TP53 P04637 1/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14030914 0.83 MEN1 (0.53) KMT2AMEN1RAB9ASMN1; SMN2HTT
SCHEMBL14030937 0.81 KMT2A (0.54) KMT2AMEN1RAB9ASMN1; SMN2NPC1
SCHEMBL10027960 0.78 KDM4E (0.71) KMT2AMEN1RAB9ATSHRGAA
SCHEMBL14030932 0.77 POLB (0.62) KMT2AMEN1RAB9ASMN1; SMN2NPC1
SCHEMBL14030924 0.77 NPC1 (0.57) KMT2AMEN1RAB9ASMN1; SMN2HTT
SCHEMBL14030959 0.77 RAB9A (0.44) KMT2AMEN1RAB9ASMN1; SMN2HTT
SCHEMBL12630843 0.74 CA1 (0.45) KMT2AMEN1RAB9ASMN1; SMN2NPC1
SCHEMBL1864525 0.74 LMNA (0.46) KMT2AMEN1RAB9ASMN1; SMN2HTT
SCHEMBL1866451 0.74 KMT2A (0.45) KMT2AMEN1RAB9ATSHRGAA
SCHEMBL12630734 0.73 CA1 (0.49) KMT2AMEN1RAB9ASMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 — — US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 — — US disclosed
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