SCHEMBL10027960

SCHEMBL10027960

CCOC(C)Oc1ccccc1NC(=O)C(C)CC

nearest known ligand 0.71

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.71
▸ KMT2A Q03164 3/20 0.71
▸ L3MBTL1 Q9Y468 2/20 0.71
▸ TSHR P16473 2/20 0.48
▸ GAA P10253 2/20 0.43
▸ LMNA P02545 3/20 0.43
▸ ALDH1A1 P00352 3/20 0.43
▸ MEN1 O00255 2/20 0.43
▸ RAB9A P51151 2/20 0.43
▸ NPSR1 Q6W5P4 1/20 0.43
▸ POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31351354 0.83 KMT2A (1.00) KDM4EKMT2AL3MBTL1GAALMNA
SCHEMBL12125175 0.81 KMT2A (0.76) KDM4EKMT2AL3MBTL1TSHRALDH1A1
SCHEMBL1866451 0.80 KMT2A (0.45) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL1864525 0.80 LMNA (0.46) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL10027968 0.80 KMT2A (0.77) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL10027963 0.79 LMNA (0.47) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL10027955 0.78 KMT2A (0.80) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL10027969 0.78 KDM4E (0.70) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL14030918 0.78 KMT2A (0.54) KDM4EKMT2AL3MBTL1TSHRGAA
SCHEMBL825597 0.76 KMT2A (0.67) KDM4EKMT2AL3MBTL1TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120021357-A1 POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME NEC CORPORATION (JP) 2012-01-26 — — US disclosed
US-7939241-B2 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2011-05-10 — — US disclosed
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method NEC CORPORATION (JP) 2009-03-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090068587-A1 (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method MMAB, DNMT3A, MAT1A KDM4E 1677/4885KMT2A 185/4885L3MBTL1 3368/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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