SCHEMBL14030937

SCHEMBL14030937

CCOCOc1ccccc1NC(=O)c1ccc(C(C)CC)cc1

nearest known ligand 0.62

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.54
▸ MEN1 O00255 4/20 0.54
▸ RAB9A P51151 3/20 0.54
▸ GAA P10253 3/20 0.51
▸ NPC1 O15118 3/20 0.51
▸ ALDH1A1 P00352 1/20 0.50
▸ KDM4E B2RXH2 2/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ P4HTM Q9NXG6 1/20 0.48
▸ AHR P35869 1/20 0.48
▸ PTK2 Q05397 1/20 0.48
▸ POLB P06746 2/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.46
▸ MAPT P10636 1/20 0.46
▸ HPGD P15428 1/20 0.46
▸ PTPRE P23469 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5031620 0.82 GAA (0.54) KMT2AMEN1RAB9AGAANPC1
SCHEMBL14030918 0.81 KMT2A (0.54) KMT2AMEN1RAB9AGAANPC1
SCHEMBL413038 0.80 NPC1 (0.61) KMT2AMEN1RAB9AGAANPC1
SCHEMBL14030980 0.80 RAB9A (0.52) KMT2AMEN1RAB9AGAANPC1
SCHEMBL14031075 0.80 RAB9A (0.52) KMT2AMEN1RAB9AGAANPC1
SCHEMBL10027955 0.78 KMT2A (0.80) KMT2AMEN1GAANPC1ALDH1A1
SCHEMBL14030932 0.77 POLB (0.62) KMT2AMEN1RAB9AGAANPC1
SCHEMBL14030924 0.77 NPC1 (0.57) KMT2AMEN1RAB9AGAANPC1
SCHEMBL14030959 0.77 RAB9A (0.44) KMT2AMEN1RAB9AGAANPC1
SCHEMBL10027983 0.75 NPC1 (0.55) KMT2AMEN1RAB9AGAANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 — — US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 — — US disclosed
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