SCHEMBL14030971

SCHEMBL14030971

CCC(C)(C)c1ccc(C(=O)Nc2ccccc2O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 5/20 0.59
RAB9A P51151 3/20 0.59
MEN1 O00255 3/20 0.59
KMT2A Q03164 3/20 0.59
TP53 P04637 2/20 0.59
ALDH1A1 P00352 1/20 0.51
GLA P06280 1/20 0.51
ATM Q13315 1/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
CA1 P00915 1/20 0.51
CA2 P00918 1/20 0.51
NR1H4 Q96RI1 1/20 0.50
HDAC1 Q13547 2/20 0.49
MAPT P10636 2/20 0.49
RECQL P46063 1/20 0.49
GAA P10253 2/20 0.49
LMNA P02545 1/20 0.49
HTT P42858 1/20 0.49
MAPK1 P28482 1/20 0.48
TERT O14746 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12432031 0.84 NPC1 (0.66) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL5225162 0.84 NPC1 (0.69) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL6029925 0.82 NPC1 (0.82) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL14030930 0.82 HDAC3 (0.48) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL14031062 0.81 KCNMA1 (0.63) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL11699043 0.80 NPC1 (0.64) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL308111 0.79 NPC1 (0.72) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL16404286 0.78 NPC1 (0.70) NPC1RAB9AMEN1KMT2ATP53
SCHEMBL13129735 0.78 MAOA (0.56) NPC1RAB9AMEN1KMT2AALDH1A1
SCHEMBL3661213 0.77 NPC1 (0.74) NPC1RAB9AMEN1KMT2ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed