SCHEMBL14035905

SCHEMBL14035905

O=C(OCc1cccc2cc3ccccc3cc12)C(F)(F)OOS

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.37
MTNR1B P49286 2/20 0.37
KDM4E B2RXH2 3/20 0.35
ALDH1A1 P00352 3/20 0.35
GAA P10253 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC7 Q8WUI4 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
PPARG P37231 1/20 0.35
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
PARP10 Q53GL7 2/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
HPGD P15428 1/20 0.34
EPHX1 P07099 1/20 0.34
PARP15 Q460N3 1/20 0.34
TRPV1 Q8NER1 1/20 0.34
GLA P06280 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035904 0.88 EPHX1 (0.44) MTNR1AMEN1KMT2APARP10HPGD
SCHEMBL14035726 0.84 FAAH (0.36) KDM4EALDH1A1HDAC1HDAC7HDAC8
SCHEMBL14035722 0.83 EPHX1 (0.44) KDM4EALDH1A1HDAC1HDAC7HDAC8
SCHEMBL12128716 0.82 MTNR1A (0.42) MTNR1AMTNR1BKDM4EALDH1A1GAA
SCHEMBL14035727 0.81 PPARG (0.45) KDM4EALDH1A1GAAPPARGMEN1
SCHEMBL14035690 0.81 SLC1A3 (0.41) GAAHDAC1HDAC8TDP1
SCHEMBL2605923 0.80 MTNR1A (0.39) MTNR1AMTNR1BKDM4EALDH1A1GAA
SCHEMBL5031423 0.78 MTNR1A (0.43) MTNR1AMTNR1BKDM4EALDH1A1GAA
SCHEMBL14035725 0.78 CYP1A2 (0.42) KDM4EALDH1A1GAAKMT2AL3MBTL1
SCHEMBL14009413 0.78 KDM4E (0.38) MTNR1AMTNR1BKDM4EALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed