SCHEMBL14035904

SCHEMBL14035904

O=C(OCc1cccc2ccccc12)C(F)(F)OOS

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.44
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
PARP10 Q53GL7 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
SLC1A3 P43003 1/20 0.41
SLC1A2 P43004 1/20 0.41
SLC1A1 P43005 1/20 0.41
ATM Q13315 1/20 0.40
FFAR1 O14842 1/20 0.40
AKR1B1 P15121 1/20 0.40
TRPV1 Q8NER1 1/20 0.39
HPGD P15428 1/20 0.38
ACP3 P15309 1/20 0.38
SIRT5 Q9NXA8 1/20 0.38
CYP1A2 P05177 1/20 0.38
MTNR1A P48039 1/20 0.37
CTNNB1 P35222 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035727 0.90 PPARG (0.45) EPHX1MEN1KMT2APARP10TDP1
SCHEMBL14035905 0.88 MTNR1A (0.37) EPHX1MEN1KMT2APARP10TDP1
SCHEMBL14035915 0.87 TRPV1 (0.42) TDP1TRPV1ACP3MTNR1ACTNNB1
SCHEMBL14035726 0.84 FAAH (0.36) EPHX1MEN1KMT2ATDP1ATM
SCHEMBL14035722 0.81 EPHX1 (0.44) EPHX1MEN1KMT2ATDP1ATM
SCHEMBL14035725 0.81 CYP1A2 (0.42) KMT2ATDP1ATMAKR1B1TRPV1
SCHEMBL12128701 0.80 EPHX1 (0.48) EPHX1MEN1KMT2APARP10TDP1
SCHEMBL24142223 0.79 EPHX1 (0.47) EPHX1MEN1KMT2APARP10TDP1
SCHEMBL14035918 0.78 KDM4E (0.46) TDP1ATMHPGD
SCHEMBL13842664 0.77 EPHX1 (0.43) EPHX1MEN1KMT2APARP10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed