SCHEMBL14035722

SCHEMBL14035722

O=C(OCc1c2ccccc2cc2ccccc12)C(F)(F)OOS

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.44
L3MBTL1 Q9Y468 6/20 0.39
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
KDM4E B2RXH2 2/20 0.39
ALDH1A1 P00352 2/20 0.39
HPGD P15428 2/20 0.39
TDP1 Q9NUW8 4/20 0.37
GPR35 Q9HC97 2/20 0.36
HTR2A P28223 1/20 0.36
CYP1A2 P05177 1/20 0.35
GLA P06280 1/20 0.35
CYP2C19 P33261 1/20 0.35
HSD17B10 Q99714 1/20 0.35
POLB P06746 1/20 0.35
HDAC1 Q13547 1/20 0.34
HDAC7 Q8WUI4 1/20 0.34
HDAC8 Q9BY41 1/20 0.34
HDAC6 Q9UBN7 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035726 0.84 FAAH (0.36) EPHX1L3MBTL1MEN1KMT2AKDM4E
SCHEMBL14035905 0.83 MTNR1A (0.37) EPHX1L3MBTL1MEN1KMT2AKDM4E
SCHEMBL14035904 0.81 EPHX1 (0.44) EPHX1MEN1KMT2AHPGDTDP1
SCHEMBL14035725 0.81 CYP1A2 (0.42) L3MBTL1KMT2AKDM4EALDH1A1HPGD
SCHEMBL12128718 0.80 EPHX1 (0.48) EPHX1L3MBTL1MEN1KMT2AKDM4E
SCHEMBL14035690 0.78 SLC1A3 (0.41) TDP1CYP1A2HDAC1HDAC8NPC1
SCHEMBL14035727 0.77 PPARG (0.45) EPHX1MEN1KMT2AKDM4EALDH1A1
SCHEMBL12133800 0.77 EPHX1 (0.50) EPHX1L3MBTL1MEN1KMT2AKDM4E
SCHEMBL14035682 0.77 ALDH1A1 (0.47) L3MBTL1MEN1KMT2AALDH1A1TDP1
SCHEMBL7263293 0.77 EPHX1 (0.50) EPHX1L3MBTL1MEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed