Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.42 |
| ▸ | CDYL | Q9Y232 | 1/20 | 0.42 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.41 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.40 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.38 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.36 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.36 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.36 |
| ▸ | ACP3 | P15309 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14035904 | 0.87 | EPHX1 (0.44) | TRPV1MTNR1ATDP1CTNNB1ACP3 | |
| SCHEMBL14035918 | 0.84 | KDM4E (0.46) | TDP1KDM4EALDH1A1MCL1 | |
| SCHEMBL12128700 | 0.81 | CDYL (0.48) | TRPV1CDYLMTNR1ACHRM5CHRM1 | |
| SCHEMBL14035727 | 0.80 | PPARG (0.45) | TRPV1TDP1KDM4EALDH1A1 | |
| SCHEMBL13842667 | 0.79 | TRPV1 (0.41) | TRPV1CDYLMTNR1ACHRM5CHRM1 | |
| SCHEMBL14035681 | 0.78 | HCAR2 (0.45) | TDP1ALDH1A1 | |
| SCHEMBL107402 | 0.78 | TRPV1 (0.43) | TRPV1CDYLMTNR1ACHRM5CHRM1 | |
| SCHEMBL14035687 | 0.77 | CYP1A2 (0.43) | — | |
| SCHEMBL14009466 | 0.77 | TRPV1 (0.42) | TRPV1CDYLMTNR1ACHRM5CHRM1 | |
| SCHEMBL14035905 | 0.76 | MTNR1A (0.37) | TRPV1MTNR1ATDP1KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274426-A1 | Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-11-06 | — | — | US | disclosed |