SCHEMBL1403773

SCHEMBL1403773

CCO[Si](CC)(OCC)OCC.c1ccc(Pc2ccccc2)cc1

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.31
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toluene SCHEMBL27989633 0.79 TSHR (0.48) LTA4HTP53
Biphenyl SCHEMBL21835012 0.79 ALDH1A1 (0.39) TP53
Diphenylether SCHEMBL9580853 0.78 LTA4H (0.55) LTA4H
Aniline SCHEMBL2114370 0.78 TSHR (0.46) TP53
Chlorobenzene SCHEMBL27989635 0.78 TSHR (0.46) LTA4H
Ether SCHEMBL7627092 0.76 LTA4H (0.37) LTA4HTP53
SCHEMBL3713270 0.76 TSHR (0.43) TP53
Anisole SCHEMBL27835022 0.76 CA4 (0.56) LTA4H
SCHEMBL28277926 0.75 TP53 (0.39) TP53
Benzene SCHEMBL28146692 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101133364-B Composition for resist underlayer film and method for producing same JSR CORP 2013-03-20 CN disclosed
EP-2297172-A2 PROCESS FOR PRODUCING NANOPARTICLES 3M Innovative Properties Company (US) 2011-03-23 EP disclosed
EP-2291460-A2 SURFACE-MODIFIED NANOPARTICLES 3M Innovative Properties Company (US) 2011-03-09 EP disclosed
WO-2009137592-A2 SURFACE-MODIFIED NANOPARTICLES 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-11-12 WO disclosed
WO-2009137595-A2 PROCESS FOR PRODUCING NANOPARTICLES 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-11-12 WO disclosed
CN-100429279-C Curable composition KANEGAFUCHI CHEMICAL IND (JP) 2008-10-29 CN disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed
WO-2006093799-A2 METAL PHOSPHATE SOLS, METAL NANOPARTICLES, METAL-CHALCOGENIDE NANOPARTICLES, AND NANOCOMPOSITES MADE THEREFROM APS LABORATORY (US) 2006-09-08 WO disclosed
WO-2006069087-A2 PREPARATION OF METAL CHALCOGENIDE NANOPARTICLES AND NANOCOMPOSITES THEREFROM APS LABORATORY (US) 2006-06-29 WO disclosed
CN-1784473-A Curable composition KANEGAFUCHI CHEMICAL IND (JP) 2006-06-07 CN disclosed