Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2222753 | 0.71 | MAPK1 (0.36) | ALDH1A1TSHR | |
| SCHEMBL7047121 | 0.63 | ALDH1A1 (0.40) | ALDH1A1TSHRCA1CA2CA9 | |
| SCHEMBL1505841 | 0.61 | TSHR (0.50) | ALDH1A1TSHR | |
| Water SCHEMBL27419918 | 0.61 | ALDH1A1 (0.38) | ALDH1A1TSHRKIF11CES1PTPN1 | |
| Trifluoromethylbenzene SCHEMBL28205538 | 0.61 | TSHR (0.88) | ALDH1A1TSHRKIF11CES1PTPN1 | |
| SCHEMBL8582066 | 0.61 | TSHR (0.58) | ALDH1A1TSHRKIF11CES1PTPN1 | |
| SCHEMBL8156245 | 0.59 | TSHR (0.41) | ALDH1A1TSHRKIF11CES1PTPN1 | |
| Biphenyl SCHEMBL27323950 | 0.59 | ALDH1A1 (0.53) | ALDH1A1TSHRKIF11PTPN1 | |
| SCHEMBL15931137 | 0.59 | ALDH1A1 (0.48) | ALDH1A1TSHRKIF11CES1PTPN1 | |
| SCHEMBL1285880 | 0.59 | MAPK1 (0.36) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1023360-B1 | PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME | SUN CHEMICAL CORP (US) | 2011-03-09 | — | — | EP | claimed |
| EP-0745633-B1 | Si containing high molecular compound and photosensitive resin composition | NEC CORP (JP) | 2000-08-02 | — | — | EP | claimed |
| WO-2021039799-A1 | CURABLE COMPOSITION | 株式会社日本触媒 | 2021-03-04 | — | — | WO | disclosed |
| US-5882843-A | ACRYLIC POLYMER, INITIATOR, SOLVENTS, THERMAL CROSSLINKER AND PIGMENTS | HOECHST JAPAN LIMITED (JP) | 1999-03-16 | — | — | US | disclosed |
| EP-0713144-B1 | Photosensitive resin composition | HOECHST JAPAN (JP) | 1998-09-23 | — | — | EP | disclosed |
| EP-0713144-A2 | Photosensitive resin composition | HOECHST JAPAN LIMITED (JP) | 1996-05-22 | — | — | EP | disclosed |