SCHEMBL2222753

SCHEMBL2222753

CC(C)(C)[I+](c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.36
ALDH1A1 P00352 3/20 0.33
TAAR1 Q96RJ0 2/20 0.33
LMNA P02545 2/20 0.33
TSHR P16473 1/20 0.33
ALOX12 P18054 1/20 0.33
ACHE P22303 1/20 0.33
ALOX15 P16050 1/20 0.33
SLC6A2 P23975 1/20 0.33
ESR1 P03372 2/20 0.32
ESR2 Q92731 2/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.31
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31
KCNN4 O15554 2/20 0.31
CYP2C19 P33261 1/20 0.30
HIF1A Q16665 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1285880 0.77 MAPK1 (0.36) MAPK1ALDH1A1TAAR1LMNATSHR
SCHEMBL7047121 0.63 ALDH1A1 (0.40) MAPK1ALDH1A1LMNATSHRALOX12
Tert-Butylbenzene SCHEMBL27650352 0.61 MAPK1 (0.50) MAPK1ALDH1A1TAAR1LMNATSHR
Biphenyl SCHEMBL27745920 0.60 ALDH1A1 (0.69) MAPK1ALDH1A1TAAR1LMNATSHR
SCHEMBL13258004 0.59 TSHR (0.48) MAPK1ALDH1A1LMNATSHRALOX12
SCHEMBL4176607 0.59 MAPK1 (0.48) MAPK1ALDH1A1TAAR1TSHRALOX15
SCHEMBL445558 0.59 CA4 (0.41) MAPK1ALDH1A1TAAR1LMNATSHR
Tert-Butylbenzene SCHEMBL18889 0.58 MAPK1 (0.55) MAPK1ALDH1A1TAAR1LMNATSHR
SCHEMBL96177 0.58 MAPK1 (0.55) MAPK1ALDH1A1TAAR1LMNATSHR
SCHEMBL8957510 0.58 TSHR (0.39) ALDH1A1LMNATSHRALOX12ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1356929-B2 Method of preparation of lithographic printing plates FUJIFILM CORP (JP) 2016-11-16 EP disclosed
EP-2512779-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP Assets B.V. (NL) 2012-10-24 EP disclosed
WO-2011084578-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP ASSETS, B.V. (NL) 2011-07-14 WO disclosed
EP-1724112-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2009-03-18 EP disclosed
US-7198876-B2 Method of preparation of lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2007-04-03 US disclosed
EP-1356929-B1 Method of preparation of lithographic printing plates FUJIFILM CORP (JP) 2007-03-14 EP disclosed
EP-1724112-A2 Lithographic printing plate precursor Fuji Photo Film Co., Ltd. (JP) 2006-11-22 EP disclosed
US-6740464-B2 HYDROPHILIC SUPPORT; HEAT SENSITIVE LAYER CONTAINING MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2004-05-25 US disclosed
EP-1356929-A2 Method of preparation of lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2003-10-29 EP disclosed
EP-1132200-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-09-12 EP disclosed