SCHEMBL14093864

SCHEMBL14093864

CN(O)C(=O)Nc1cccc(-c2nc(S)nc(S)n2)c1

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ PNPLA2 Q96AD5 1/20 0.46
▸ HDAC6 Q9UBN7 1/20 0.46
▸ MAPT P10636 2/20 0.41
▸ KDM1A O60341 1/20 0.41
▸ TP53 P04637 2/20 0.40
▸ POLB P06746 1/20 0.40
▸ CNR1 P21554 1/20 0.39
▸ MGLL Q99685 1/20 0.39
▸ NQO2 P16083 1/20 0.38
▸ NPC1 O15118 2/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ SIRT1 Q96EB6 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093870 0.87 GAA (0.36) PNPLA2HDAC6MAPTKDM1ATP53
SCHEMBL14606449 0.83 MAPT (0.58) MAPTTP53POLBNQO2NPC1
SCHEMBL8103761 0.77 TP53 (0.53) PNPLA2HDAC6TP53POLBRAB9A
SCHEMBL14093860 0.75 TP53 (0.36) PNPLA2HDAC6MAPTTP53NPC1
SCHEMBL14360698 0.72 HAVCR2 (0.47) HDAC6MAPTPOLBNPC1RAB9A
SCHEMBL7618599 0.71 HSD17B10 (0.62) SMN1; SMN2GAA
SCHEMBL14363874 0.71 ALDH1A1 (0.41) MAPTTP53POLBMGLLKDM4E
SCHEMBL13656906 0.70 POLB (0.42) PNPLA2HDAC6TP53POLBKDM4E
SCHEMBL7616949 0.70 KMT2A (0.59) MAPTTP53NPC1RAB9AKDM4E
SCHEMBL7618218 0.70 GAA (0.58) MAPTNPC1RAB9AKDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1818718-A2 Photothermographic material and method of thermal development of the same Fuji Photo Film Co., Ltd. (JP) 2007-08-15 — — EP disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 — — US disclosed
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