SCHEMBL14360698

SCHEMBL14360698

O=C(COC(=O)NO)Nc1cccc(-c2nc(S)nc(S)n2)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HAVCR2 Q8TDQ0 7/20 0.47
▸ CDK8 P49336 2/20 0.44
▸ MAPT P10636 5/20 0.43
▸ KMT2A Q03164 5/20 0.43
▸ MEN1 O00255 4/20 0.43
▸ KDM4E B2RXH2 3/20 0.42
▸ LMNA P02545 3/20 0.42
▸ SMN1; SMN2 Q16637 3/20 0.42
▸ NPC1 O15118 2/20 0.42
▸ HPGD P15428 2/20 0.42
▸ TSHR P16473 2/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ HDAC1 Q13547 1/20 0.41
▸ HDAC6 Q9UBN7 1/20 0.41
▸ ALDH1A1 P00352 5/20 0.40
▸ POLB P06746 2/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ GLA P06280 1/20 0.40
▸ GAA P10253 1/20 0.40
▸ HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14606449 0.76 MAPT (0.58) MAPTKMT2AMEN1KDM4ESMN1; SMN2
SCHEMBL14093864 0.72 PNPLA2 (0.46) MAPTKDM4ESMN1; SMN2NPC1HDAC6
SCHEMBL14363874 0.67 ALDH1A1 (0.41) MAPTKMT2AMEN1KDM4ELMNA
SCHEMBL14093870 0.65 GAA (0.36) MAPTLMNASMN1; SMN2TSHRHDAC6
SCHEMBL5545852 0.64 CYP2C19 (0.60) HAVCR2MAPTKDM4ELMNASMN1; SMN2
SCHEMBL1462379 0.63 JAK3 (0.74) CDK8MAPTKMT2AMEN1LMNA
SCHEMBL5944252 0.63 HAVCR2 (0.62) HAVCR2MAPTKMT2AMEN1KDM4E
SCHEMBL11286955 0.62 FGFR3 (0.49) MAPTKMT2AMEN1NPC1
SCHEMBL8228787 0.62 CYP2C19 (0.67) CDK8MAPTKMT2AMEN1SMN1; SMN2
SCHEMBL14075089 0.62 CYP2C19 (0.57) HAVCR2MAPTKDM4ELMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 — — EP disclosed
Send feedback