SCHEMBL14093870

SCHEMBL14093870

CN(O)C(=O)NNc1cccc(-c2nc(S)nc(S)n2)c1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 1/20 0.36
▸ PNPLA2 Q96AD5 1/20 0.36
▸ HDAC6 Q9UBN7 1/20 0.36
▸ KDM1A O60341 2/20 0.35
▸ CYP1A2 P05177 2/20 0.35
▸ CYP3A4 P08684 2/20 0.35
▸ TSHR P16473 2/20 0.35
▸ USP2 O75604 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ CLK4 Q9HAZ1 1/20 0.35
▸ MAPT P10636 3/20 0.34
▸ TP53 P04637 2/20 0.34
▸ LMNA P02545 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ CNR1 P21554 1/20 0.33
▸ FYN P06241 1/20 0.33
▸ POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093864 0.87 PNPLA2 (0.46) GAAPNPLA2HDAC6KDM1AMAPT
SCHEMBL14606449 0.75 MAPT (0.58) GAACYP1A2TSHRCYP2C19MAPT
SCHEMBL14557593 0.74 ALDH1A1 (0.50) GAAMAPTSMN1; SMN2ALDH1A1POLB
SCHEMBL14557589 0.70 ALOX5 (0.59) GAACYP3A4TSHRCYP2C19LMNA
SCHEMBL14363874 0.69 ALDH1A1 (0.41) CYP1A2CYP3A4TSHRUSP2CYP2D6
SCHEMBL14360698 0.65 HAVCR2 (0.47) GAAHDAC6TSHRCYP2C19MAPT
SCHEMBL14093868 0.64 CNR1 (0.39) TSHRMAPTTP53LMNASMN1; SMN2
SCHEMBL14093860 0.63 TP53 (0.36) GAAPNPLA2HDAC6MAPTTP53
SCHEMBL8103761 0.62 TP53 (0.53) GAAPNPLA2HDAC6CYP1A2TP53
SCHEMBL14557592 0.62 GAA (0.49) GAACYP1A2CYP3A4CYP2C19MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1441254-B1 Photothermographic material FUJIFILM CORP (JP) 2007-03-28 — — EP disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 — — EP disclosed
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