SCHEMBL14093860

SCHEMBL14093860

CN(O)C(=O)Nc1cccc(Nc2cc(S)nc(S)n2)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TP53 P04637 1/20 0.36
▸ BRAF P15056 1/20 0.36
▸ KDM4E B2RXH2 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ EGFR P00533 1/20 0.36
▸ DYRK3 O43781 1/20 0.35
▸ CCNT1 O60563 1/20 0.35
▸ CCNA2 P20248 1/20 0.35
▸ CDK2 P24941 1/20 0.35
▸ CDK9 P50750 1/20 0.35
▸ CDK5 Q00535 1/20 0.35
▸ DYRK1A Q13627 1/20 0.35
▸ CDK5R1 Q15078 1/20 0.35
▸ DYRK2 Q92630 1/20 0.35
▸ DYRK1B Q9Y463 1/20 0.35
▸ GAA P10253 1/20 0.35
▸ PNPLA2 Q96AD5 1/20 0.35
▸ HDAC6 Q9UBN7 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093919 0.84 BRAF (0.49) TP53BRAFKDM4ERAB9ASMN1; SMN2
SCHEMBL14432567 0.81 GAA (0.34) KDM4ENPC1RAB9ASMN1; SMN2GAA
SCHEMBL14360122 0.78 TERT (0.43) EGFRCCNT1CDK9GAAHDAC6
SCHEMBL8103761 0.78 TP53 (0.53) TP53RAB9AGAAPNPLA2HDAC6
SCHEMBL14093864 0.75 PNPLA2 (0.46) TP53KDM4ENPC1RAB9ASMN1; SMN2
SCHEMBL14093902 0.75 TERT (0.42) SMN1; SMN2CCNT1CDK9
SCHEMBL14124520 0.75 L3MBTL1 (0.40) TP53KDM4ESMN1; SMN2CCNT1CDK9
SCHEMBL14608486 0.74 HDAC6 (0.57) TP53BRAFGAAHDAC6MAPT
SCHEMBL7618599 0.69 HSD17B10 (0.62) SMN1; SMN2GAA
SCHEMBL13656906 0.68 POLB (0.42) TP53KDM4EGAAPNPLA2HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1818718-A2 Photothermographic material and method of thermal development of the same Fuji Photo Film Co., Ltd. (JP) 2007-08-15 — — EP disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 — — EP disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 — — US disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 — — US disclosed
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