SCHEMBL14093883

SCHEMBL14093883

Oc1cc(-c2nnc(S)o2)cc(O)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SNCA P37840 2/20 0.47
▸ PSMB8 P28062 1/20 0.44
▸ PTGS1 P23219 5/20 0.36
▸ PTGS2 P35354 4/20 0.36
▸ PTPN1 P18031 2/20 0.33
▸ SIRT1 Q96EB6 1/20 0.33
▸ CALCRL Q16602 1/20 0.33
▸ KDM4E B2RXH2 2/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ HPGD P15428 2/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ MAPK8 P45983 1/20 0.32
▸ NPC1 O15118 1/20 0.31
▸ RAB9A P51151 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ TP53 P04637 1/20 0.30
▸ PKM P14618 1/20 0.30
▸ FTO Q9C0B1 2/20 0.30
▸ MEN1 O00255 1/20 0.30
▸ CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14557100 0.83 HPGD (0.39) SNCAPTGS1PTGS2KDM4EALDH1A1
SCHEMBL9144585 0.81 SNCA (0.75) SNCAPTPN1MAPT
SCHEMBL9364714 0.73 ACHE (0.47) SNCAPTGS2NPC1RAB9ASMN1; SMN2
SCHEMBL406885 0.68 NPC1 (0.70) KDM4EALDH1A1HPGDL3MBTL1NPC1
SCHEMBL13297698 0.68 KDM6B (0.47) SNCAPTGS2KDM4EALDH1A1HPGD
SCHEMBL29006429 0.67 KDM4E (0.77) KDM4EALDH1A1HPGDL3MBTL1SMN1; SMN2
SCHEMBL10365053 0.67 TP53 (0.37) KDM4EALDH1A1HPGDNPC1RAB9A
SCHEMBL987340 0.67 PKM (0.71) KDM4EALDH1A1HPGDL3MBTL1NPC1
SCHEMBL2800972 0.67 ALDH1A1 (0.51) KDM4EALDH1A1HPGDNPC1RAB9A
SCHEMBL15674749 0.65 NOTUM (0.44) SNCAPTPN1HPGDNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1441254-B1 Photothermographic material FUJIFILM CORP (JP) 2007-03-28 — — EP disclosed
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