SCHEMBL14124520

SCHEMBL14124520

CN(CCC(=O)Nc1cccc(Nc2cc(S)nc(S)n2)c1)C1CCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ POLB P06746 1/20 0.40
▸ ATM Q13315 1/20 0.40
▸ MAPT P10636 3/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ ALDH1A1 P00352 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ TP53 P04637 2/20 0.40
▸ CYP1A2 P05177 1/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ CYP2C9 P11712 1/20 0.40
▸ CYP2C19 P33261 1/20 0.40
▸ CDK4 P11802 2/20 0.39
▸ CCND3 P30281 2/20 0.39
▸ HDAC1 Q13547 1/20 0.39
▸ CCNT1 O60563 2/20 0.38
▸ CDK9 P50750 2/20 0.38
▸ MCHR1 Q99705 2/20 0.38
▸ PKM P14618 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093902 0.82 TERT (0.42) POLBSMN1; SMN2CCNT1CDK9TERT
SCHEMBL14360122 0.80 TERT (0.43) MAPTMEN1KMT2AHDAC1CCNT1
SCHEMBL14093860 0.75 TP53 (0.36) MAPTSMN1; SMN2TP53CCNT1CDK9
SCHEMBL14093919 0.75 BRAF (0.49) L3MBTL1POLBMAPTSMN1; SMN2MEN1
SCHEMBL14342071 0.70 TERT (0.37) POLBMAPTSRCTERT
SCHEMBL14608486 0.65 HDAC6 (0.57) POLBMAPTMEN1KMT2ATP53
SCHEMBL14608144 0.64 EGFR (0.57) L3MBTL1POLBSMN1; SMN2MEN1KMT2A
SCHEMBL19444772 0.63 ALDH1A1 (0.64) L3MBTL1POLBATMMAPTSMN1; SMN2
SCHEMBL3651019 0.61 HDAC3 (0.62) POLBMAPTSMN1; SMN2MEN1ALDH1A1
SCHEMBL13677592 0.61 BCHE (0.40) L3MBTL1POLBATMMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
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