SCHEMBL14130418

SCHEMBL14130418

O=C(Oc1ccc2ccccc2c1/N=N/c1ccccc1)c1cc(C(=O)Oc2ccc3ccccc3c2/N=N/c2ccccc2)cc(C(=O)Oc2ccc3ccccc3c2/N=N/c2ccccc2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.53
▸ KMT2A Q03164 8/20 0.53
▸ MEN1 O00255 7/20 0.53
▸ THRB P10828 3/20 0.53
▸ ALDH1A1 P00352 2/20 0.53
▸ PKM P14618 1/20 0.53
▸ TDP1 Q9NUW8 5/20 0.43
▸ L3MBTL1 Q9Y468 4/20 0.43
▸ RECQL P46063 2/20 0.43
▸ GAA P10253 2/20 0.43
▸ CASP3 P42574 2/20 0.43
▸ SENP8 Q96LD8 2/20 0.43
▸ SENP7 Q9BQF6 2/20 0.43
▸ SENP6 Q9GZR1 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ ALPL P05186 1/20 0.43
▸ HSP90AA1 P07900 1/20 0.43
▸ ALPI P09923 1/20 0.43
▸ ALPG P10696 1/20 0.43
▸ MMP14 P50281 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130189 0.99 MAPT (0.52) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL14130188 0.85 CYP1A2 (0.46) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL14130422 0.82 THRB (0.46) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL14130426 0.81 THRB (0.46) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL13609828 0.80 THRB (0.51) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL13609833 0.79 THRB (0.50) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL14130172 0.78 KMT2A (0.46) MAPTKMT2AMEN1TDP1L3MBTL1
SCHEMBL23964328 0.77 THRB (0.61) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL27792385 0.77 ALDH1A1 (0.57) MAPTKMT2AMEN1THRBALDH1A1
SCHEMBL25821501 0.76 MAPT (0.48) MAPTKMT2AMEN1ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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