SCHEMBL14130422

SCHEMBL14130422

Cc1ccccc1/N=N/c1c(OC(=O)c2cc(C(=O)Oc3ccc4ccccc4c3/N=N/c3ccccc3C)cc(C(=O)Oc3ccc4ccccc4c3/N=N/c3ccccc3C)c2)ccc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ THRB P10828 2/20 0.46
▸ KMT2A Q03164 5/20 0.41
▸ MAPT P10636 3/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ PKM P14618 1/20 0.41
▸ ALOX5 P09917 2/20 0.40
▸ PTGES O14684 1/20 0.40
▸ KDM4E B2RXH2 2/20 0.39
▸ NPC1 O15118 2/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ NCEH1 Q6PIU2 2/20 0.39
▸ SUMO2 P61956 1/20 0.38
▸ SUMO1 P63165 1/20 0.38
▸ SENP7 Q9BQF6 1/20 0.38
▸ SENP3 Q9H4L4 1/20 0.38
▸ SENP2 Q9HC62 1/20 0.38
▸ SENP1 Q9P0U3 1/20 0.38
▸ ELANE P08246 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130426 0.92 THRB (0.46) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL14130188 0.89 CYP1A2 (0.46) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL373812 0.83 THRB (0.43) THRBKMT2AMAPTALDH1A1KDM4E
SCHEMBL11964796 0.83 KMT2A (0.49) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL14130418 0.82 MAPT (0.53) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL20148508 0.82 THRB (0.41) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL20153118 0.82 THRB (0.41) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL14130189 0.81 MAPT (0.52) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL11964747 0.79 THRB (0.40) THRBKMT2AMAPTMEN1ALDH1A1
SCHEMBL13609834 0.78 THRB (0.45) THRBKMT2AMAPTMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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