SCHEMBL14130426

SCHEMBL14130426

Cc1ccccc1/N=N/c1ccc(/N=N/c2c(OC(=O)c3cc(C(=O)Oc4ccc5ccccc5c4/N=N/c4ccc(/N=N/c5ccccc5C)cc4C)cc(C(=O)Oc4ccc5ccccc5c4/N=N/c4ccc(/N=N/c5ccccc5C)cc4C)c3)ccc3ccccc23)c(C)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ THRB P10828 2/20 0.46
▸ NPC1 O15118 4/20 0.42
▸ RAB9A P51151 4/20 0.42
▸ MAPT P10636 4/20 0.42
▸ POLB P06746 1/20 0.42
▸ GLO1 Q04760 1/20 0.41
▸ KMT2A Q03164 7/20 0.41
▸ MEN1 O00255 6/20 0.41
▸ TDP1 Q9NUW8 2/20 0.41
▸ TP53 P04637 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ TSHR P16473 1/20 0.41
▸ MAPK1 P28482 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ PKM P14618 1/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ ENPP2 Q13822 2/20 0.38
▸ SENP2 Q9HC62 1/20 0.37
▸ SENP1 Q9P0U3 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130422 0.92 THRB (0.46) THRBNPC1MAPTGLO1KMT2A
SCHEMBL20148508 0.90 THRB (0.41) THRBNPC1RAB9AMAPTPOLB
SCHEMBL20153118 0.90 THRB (0.41) THRBNPC1RAB9AMAPTPOLB
SCHEMBL13609834 0.87 THRB (0.45) THRBNPC1RAB9AMAPTPOLB
SCHEMBL20153095 0.85 THRB (0.37) THRBNPC1RAB9AMAPTPOLB
SCHEMBL20148509 0.84 POLB (0.36) THRBNPC1RAB9AMAPTPOLB
SCHEMBL14130179 0.83 TDP1 (0.51) RAB9AMAPTKMT2AMEN1TDP1
SCHEMBL14130188 0.82 CYP1A2 (0.46) THRBNPC1MAPTPOLBKMT2A
SCHEMBL14130189 0.82 MAPT (0.52) THRBNPC1RAB9AMAPTPOLB
SCHEMBL14130418 0.81 MAPT (0.53) THRBNPC1RAB9AMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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