SCHEMBL14133307

SCHEMBL14133307

CCC(=O)OC1CCCCCCOC1=O

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
HPGD P15428 2/20 0.45
KDM4E B2RXH2 2/20 0.45
HSD17B10 Q99714 1/20 0.45
MAPK1 P28482 3/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
TSHR P16473 1/20 0.39
POLB P06746 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.38
FKBP1A P62942 1/20 0.38
MMP3 P08254 1/20 0.37
GAA P10253 1/20 0.37
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
CHRM1 P11229 1/20 0.36
CHRM3 P20309 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7747327 0.87 MAPK1 (0.55) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL4572006 0.87 MAPK1 (0.55) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL18286526 0.78 FKBP1A (0.50) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL22169128 0.78 NAAA (0.51)
SCHEMBL27436674 0.78 MAPK1 (0.43) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL23080071 0.75 MAPK1 (0.41) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL26112416 0.75 KDM4E (0.38) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL7746309 0.74 MAPK1 (0.52) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL7747599 0.74 MAPK1 (0.52) ALDH1A1HPGDKDM4EHSD17B10MAPK1
SCHEMBL685838 0.74 POLB (0.38) ALDH1A1HPGDKDM4EHSD17B10MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795945-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-08-05 US disclosed
US-20120301831-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed