Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 4/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.55 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7747327 | 1.00 | MAPK1 (0.55) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL14133307 | 0.87 | ALDH1A1 (0.45) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7746309 | 0.86 | MAPK1 (0.52) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7747599 | 0.86 | MAPK1 (0.52) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL14302990 | 0.84 | MAPK1 (0.52) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7749487 | 0.83 | CYP1A2 (0.50) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7747633 | 0.83 | CYP1A2 (0.50) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7742216 | 0.83 | CYP1A2 (0.50) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7746326 | 0.83 | MAPK1 (0.56) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E | |
| SCHEMBL7747597 | 0.83 | MAPK1 (0.56) | MAPK1CYP1A2CYP2C19CYP2C9KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152694-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-05-18 | — | — | US | disclosed |
| US-20230152694-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-05-18 | — | — | US | disclosed |
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| US-10562991-B2 | Developer, pattern forming method, and electronic device manufacturing method | FUJIFILM CORPORATION (JP) | 2020-02-18 | — | — | US | disclosed |
| US-10319735-B2 | Method for manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-11 | — | — | US | disclosed |
| US-20180186907-A1 | DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2018-07-05 | — | — | US | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170186768-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2017-06-29 | — | — | US | disclosed |
| CN-105102390-A | Method for manufacturing thin-walled glass substrate | NISSAN CHEMICAL IND LTD | 2015-11-25 | — | — | CN | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-7217498-B2 | Multilayer; support with image forming layer containing water insoluble polymer and soluble in alkaline aqueous solutions | FUJIFILM CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-7217498-B2 | Multilayer; support with image forming layer containing water insoluble polymer and soluble in alkaline aqueous solutions | FUJIFILM CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-7217501-B2 | Infrared-sensitive lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-20070099120-A1 | Developing solution for lithographic printing plate precursor and method for making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099120-A1 | Developing solution for lithographic printing plate precursor and method for making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-7189015-B2 | Method for replenishing development replenisher in automatic developing machine for photosensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189015-B2 | Method for replenishing development replenisher in automatic developing machine for photosensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| EP-1757980-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| WO-2001018231-A2 | METHOD FOR PRODUCING (R) OR (S)-HYDROXY-η-BUTYROLACTONE | LONZA AG (CH) | 2001-03-15 | — | — | WO | disclosed |