SCHEMBL14134143

SCHEMBL14134143

OC1CCC(CC2CCC(O)CC2O)C(O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8027081 0.81 GBA1 (0.34) —
SCHEMBL5868483 0.79 SHBG (0.34) —
SCHEMBL15484132 0.75 LMNA (0.45) —
SCHEMBL7191308 0.74 LMNA (0.32) —
SCHEMBL28103940 0.74 SLC6A12 (0.46) —
SCHEMBL8863411 0.72 SHBG (0.33) —
SCHEMBL15802891 0.69 ALOX5 (0.44) —
SCHEMBL27939663 0.69 — —
SCHEMBL18905183 0.69 — —
SCHEMBL63815 0.69 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795945-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-08-05 — — US disclosed
US-8795945-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-08-05 — — US disclosed
US-20120301831-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-11-29 — — US disclosed
US-20120301831-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-11-29 — — US disclosed
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