Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A1 | P18405 | 1/20 | 0.49 |
| ▸ | XDH | P47989 | 2/20 | 0.48 |
| ▸ | GABRA1 | P14867 | 5/20 | 0.47 |
| ▸ | GABRB2 | P47870 | 5/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | CNR1 | P21554 | 2/20 | 0.47 |
| ▸ | CNR2 | P34972 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | PPARG | P37231 | 1/20 | 0.47 |
| ▸ | PPARD | Q03181 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | TNKS | O95271 | 1/20 | 0.43 |
| ▸ | PARP1 | P09874 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL323547 | 0.87 | XDH (0.54) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| Hydrogen Sulfide SCHEMBL6721312 | 0.85 | XDH (0.52) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL7943871 | 0.85 | GABRA1 (0.52) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL4012043 | 0.85 | GABRA1 (0.52) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL17974429 | 0.83 | XDH (0.42) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL21323475 | 0.83 | SRD5A1 (0.44) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL10358540 | 0.83 | GABRA1 (0.46) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL1053052 | 0.83 | XDH (0.42) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL6398012 | 0.81 | SRD5A1 (0.49) | SRD5A1XDHGABRA1GABRB2ALDH1A1 | |
| SCHEMBL6013229 | 0.81 | GABRA1 (0.52) | SRD5A1XDHGABRA1GABRB2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110207326-A1 | SLURRY FOR POLISHING AND PLANARIZATION METHOD OF INSULATING LAYER USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-25 | — | — | US | claimed |
| CN-106867411-B | Slurry composition for chemical mechanical polishing, method for producing the same, polishing method, method for manufacturing semiconductor device, and polishing apparatus | 三星电子株式会社 | 2021-04-06 | — | — | CN | disclosed |
| US-10829690-B2 | Slurry composition for chemical mechanical polishing, method of preparing the same, and method of fabricating semiconductor device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-11-10 | — | — | US | disclosed |
| EP-3288938-B1 | HERBICIDAL COMPOUNDS | SYNGENTA PARTICIPATIONS AG (CH) | 2020-05-13 | — | — | EP | disclosed |
| CN-110872472-A | Slurry composition, method of preparing the same, and method of manufacturing semiconductor device using the same | 三星电子株式会社 | 2020-03-10 | — | — | CN | disclosed |
| US-20200071613-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PREPARING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-03-05 | — | — | US | disclosed |
| US-20170107404-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PREPARING THE SAME, AND POLISHING METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-04-20 | — | — | US | disclosed |
| US-8546261-B2 | Slurry for polishing and planarization method of insulating layer using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-10-01 | — | — | US | disclosed |
| CN-101903436-B | Phenalkylamines and salified amine mixtures as curing agents for epoxy resins | COGNIS IP MAN GMBH | 2013-02-27 | — | — | CN | disclosed |
| US-20110207326-A1 | SLURRY FOR POLISHING AND PLANARIZATION METHOD OF INSULATING LAYER USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-25 | — | — | US | disclosed |
| EP-2123689-B1 | Curing agents for epoxy resins | COGNIS IP MAN GMBH (DE) | 2011-03-09 | — | — | EP | disclosed |
| CN-101903436-A | Phenalkylamines and salified amine mixtures as curing agents for epoxy resins | COGNIS IP MAN GMBH | 2010-12-01 | — | — | CN | disclosed |
| EP-2123689-A1 | Curing agents for epoxy resins | Cognis IP Management GmbH (DE) | 2009-11-25 | — | — | EP | disclosed |
| US-4043857-A | Method of joining plastic pipe | ALLIED CHEMICAL CORPORATION (US) | 1977-08-23 | — | — | US | disclosed |
| US-4009212-A | METHOD FOR THE PREPARATION OF META DIHYDROXYBENZENES | KOPPERS COMPANY, INC. (US) | 1977-02-22 | — | — | US | disclosed |
| US-3961814-A | Method of joining plastic pipe | ALLIED CHEMICAL CORPORATION (US) | 1976-06-08 | — | — | US | disclosed |