SCHEMBL1415013

SCHEMBL1415013

CC1=C(C#N)CC(C#N)=C(C)N1

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.30
RXFP1 Q9HBX9 1/20 0.30
RCE1 Q9Y256 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7243398 0.80
SCHEMBL12649771 0.79 MET (0.35)
SCHEMBL14155599 0.74 ERBB2 (0.35) KDM4E
SCHEMBL14155583 0.72 MMP3 (0.39) KDM4E
SCHEMBL14155649 0.72 ALDH1A1 (0.33) KDM4E
SCHEMBL11792839 0.61 ALDH1A1 (0.42) KDM4ERXFP1RCE1
SCHEMBL11791746 0.60 ALDH1A1 (0.49) KDM4E
SCHEMBL3753346 0.59 ALDH1A1 (0.49) KDM4E
SCHEMBL1897635 0.59
SCHEMBL13868320 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117720403-A Preparation method of asymmetric ketone compound 大连理工大学 2024-03-19 CN claimed
EP-0578177-B1 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern NITTO DENKO CORP (JP) 1997-03-05 EP claimed
EP-0578177-A2 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern NITTO DENKO CORPORATION (JP) 1994-01-12 EP claimed
CN-117720403-A Preparation method of asymmetric ketone compound 大连理工大学 2024-03-19 CN disclosed
US-8728705-B2 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method NITTO DENKO CORPORATION (JP) 2014-05-20 US disclosed
US-8551989-B2 Substituted 4-(indazolyl)-1,4-dihydropyridines and methods of use thereof BAYER INTELLECTUAL PROPERTY GMBH (DE) 2013-10-08 US disclosed
EP-2294062-B1 SUBSTITUTED 4- (INDAZOLYL) -1,4-DIHYDROPYRIDINES AND METHODS OF USE THEREOF BAYER IP GMBH (DE) 2013-08-21 EP disclosed
US-20130118788-A1 POLYIMIDE PRECURSOR COMPOSITION, AND WIRING CIRCUIT BOARD EMPLOYING THE COMPOSITION NITTO DENKO CORPORATION (JP) 2013-05-16 US disclosed
EP-2121608-B1 DIHYDROPYRIDINE DERIVATIVES USEFUL AS PROTEIN KINASE INHIBITORS BAYER IP GMBH (DE) 2012-11-14 EP disclosed
US-20110207731-A1 SUBSTITUTED 4-(INDAZOLYL)-1,4-DIHYDROPYRIDINES AND METHODS OF USE THEREOF BAYER SCHERING PHARMA AKTIENGESELLSCHAFT (DE) 2011-08-25 US disclosed
EP-2294062-A1 SUBSTITUTED 4- (INDAZOLYL) -1,4-DIHYDROPYRIDINES AND METHODS OF USE THEREOF Bayer Schering Pharma Aktiengesellschaft (DE) 2011-03-16 EP disclosed
US-20100304298-A1 NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING THE NEGATIVE PHOTOSENSITIVE MATERIAL, AND NEGATIVE PATTERN FORMING METHOD NITTO DENKO CORPORATION (JP) 2010-12-02 US disclosed
CN-101900940-A Negative photosensitive material, photonasty base material and minus pattern formation method NITTO DENKO CORP 2010-12-01 CN disclosed
WO-2009149837-A1 SUBSTITUTED 4- (INDAZOLYL) -1,4-DIHYDROPYRIDINES AND METHODS OF USE THEREOF BAYER SCHERING PHARMA AKTIENGESELLSCHAFT (DE) 2009-12-17 WO disclosed
US-6265127-B1 1, 4-dihydrophyridine charge control agents for electrostatographic toners and developers EASTMAN KODAK COMPANY 2001-07-24 US disclosed
EP-1109070-A2 1,4-Dihydropyridine charge control agents for electrostatographic toners and developers EASTMAN KODAK COMPANY (US) 2001-06-20 EP disclosed
US-5851736-A Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern NITTO DENKO CORPORATION (JP) 1998-12-22 US disclosed
EP-0578177-B1 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern NITTO DENKO CORP (JP) 1997-03-05 EP disclosed
EP-0578177-A2 Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern NITTO DENKO CORPORATION (JP) 1994-01-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110207731-A1 SUBSTITUTED 4-(INDAZOLYL)-1,4-DIHYDROPYRIDINES AND METHODS OF USE THEREOF MET, ERBB4, RET KDM4E 715/4885RXFP1 3423/4885RCE1 3966/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.