Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | TP53 | P04637 | 1/20 | 0.51 |
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | SLC18A3 | Q16572 | 2/20 | 0.47 |
| ▸ | NOS3 | P29474 | 2/20 | 0.41 |
| ▸ | NOS1 | P29475 | 2/20 | 0.41 |
| ▸ | NOS2 | P35228 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | XBP1 | P17861 | 1/20 | 0.40 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28722738 | 0.89 | LMNA (0.59) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL10807810 | 0.89 | CYP11B2 (0.47) | LMNASMN1; SMN2MAPTSLC18A3NOS3 | |
| SCHEMBL346325 | 0.89 | LMNA (0.59) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL8025878 | 0.89 | LMNA (0.59) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| Bromide SCHEMBL7708329 | 0.87 | CYP11B2 (0.45) | LMNASMN1; SMN2MAPTSLC18A3NOS3 | |
| SCHEMBL43080 | 0.87 | SLC18A3 (0.56) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL532780 | 0.86 | SMN1; SMN2 (0.42) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL18117721 | 0.83 | MAPT (0.54) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL2537599 | 0.83 | SLC18A3 (0.52) | LMNASMN1; SMN2MAPTALDH1A1TP53 | |
| SCHEMBL29762350 | 0.82 | SLC18A3 (0.52) | SMN1; SMN2MAPTALDH1A1SLC18A3CYP11B2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4341354-A1 | CURABLE COMPOSITION AND USE THEREOF | Henkel AG & Co. KGaA (DE) | 2024-03-27 | — | — | EP | claimed |
| WO-2022241772-A1 | CURABLE COMPOSITION AND USE THEREOF | HENKEL AG & CO. KGAA (DE) | 2022-11-24 | — | — | WO | claimed |
| EP-2021873-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-02-11 | — | — | EP | claimed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | claimed |
| WO-2024120763-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2024-06-13 | — | — | WO | disclosed |
| EP-4382306-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2024-06-12 | — | — | EP | disclosed |
| US-20240100820-A1 | Lithographic Printing Press Make-Ready Method | AGFA OFFSET BV (BE) | 2024-03-28 | — | — | US | disclosed |
| EP-4341354-A1 | CURABLE COMPOSITION AND USE THEREOF | Henkel AG & Co. KGaA (DE) | 2024-03-27 | — | — | EP | disclosed |
| EP-4263224-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2023-10-25 | — | — | EP | disclosed |
| EP-4225582-A1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA OFFSET BV (BE) | 2023-08-16 | — | — | EP | disclosed |
| CN-116601006-A | Printing activity preparation method for lithographic printing machine | 爱克发胶印有限公司 | 2023-08-15 | — | — | CN | disclosed |
| US-20230211599-A1 | Lithographic Photopolymer Printing Plate Precursor with Improved Daylight Stability | AGFA OFFSET BV (BE) | 2023-07-06 | — | — | US | disclosed |
| WO-2009023112-A1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE | EASTMAN KODAK COMPANY (US) | 2009-02-19 | — | — | WO | disclosed |
| EP-2021873-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-02-11 | — | — | EP | disclosed |
| WO-2008156552-A1 | ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE | EASTMAN KODAK COMPANY (US) | 2008-12-24 | — | — | WO | disclosed |
| WO-2008150441-A1 | IMAGEABLE ELEMENTS AND METHODS OF USE IN NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2008-12-11 | — | — | WO | disclosed |
| WO-2008140726-A1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE | EASTMAN KODAK COMPANY (US) | 2008-11-20 | — | — | WO | disclosed |
| WO-2008036170-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-03-27 | — | — | WO | disclosed |
| WO-2008013766-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-01-31 | — | — | WO | disclosed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | disclosed |