Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9520649 | 0.79 | LMNA (0.36) | ALDH1A1 | |
| SCHEMBL47389 | 0.77 | — | — | |
| SCHEMBL12533467 | 0.77 | — | — | |
| SCHEMBL9924493 | 0.77 | ALDH1A1 (0.33) | HMGCRALDH1A1 | |
| SCHEMBL9243862 | 0.76 | — | — | |
| SCHEMBL47430 | 0.76 | — | — | |
| SCHEMBL12972115 | 0.75 | — | — | |
| SCHEMBL12405235 | 0.75 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL12405238 | 0.75 | HSD11B1 (0.33) | ALDH1A1 | |
| SCHEMBL13779563 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-8945812-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8911928-B2 | Resist composition, method of forming resist pattern, polymeric compound and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-20130244176-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120308928-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |