SCHEMBL14264012

SCHEMBL14264012

CC(=O)c1cc(I)c(I)c(I)c1

nearest known ligand 0.61

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ TPMT P51580 2/20 0.61
▸ CA5A P35218 1/20 0.50
▸ LMNA P02545 2/20 0.41
▸ MAPT P10636 3/20 0.36
▸ HPGD P15428 2/20 0.36
▸ RAB9A P51151 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ NPC1 O15118 1/20 0.35
▸ HSD17B1 P14061 1/20 0.34
▸ CYP2A6 P11509 1/20 0.34
▸ ESR1 P03372 1/20 0.33
▸ PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13624841 0.84 CA5A (0.56) TPMTCA5ALMNAHPGDKMT2A
SCHEMBL14264013 0.82 TPMT (0.44) TPMTCA5AMAPTHPGDRAB9A
SCHEMBL14277282 0.82 CA5A (0.48) TPMTCA5ALMNAMAPTHPGD
SCHEMBL22982377 0.80 CA5A (0.46) TPMTCA5ALMNAMAPTHPGD
SCHEMBL16769478 0.77 CA5A (0.48) TPMTCA5ALMNAMAPTHPGD
SCHEMBL31500495 0.77 CA5A (0.54) TPMTCA5ALMNAMAPTHPGD
SCHEMBL22991541 0.77 TPMT (0.61) TPMTCA5ALMNAMAPTKMT2A
SCHEMBL18629882 0.77 CA5A (0.48) TPMTCA5ALMNAMAPTHPGD
SCHEMBL669554 0.76 CA5A (0.67) CA5ALMNAMAPTHPGDRAB9A
SCHEMBL13307545 0.76 CA5A (0.52) TPMTCA5ALMNAMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
US-20220348698-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-11-03 — — US disclosed
CN-114245792-A Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof 三菱瓦斯化学株式会社 2022-03-25 — — CN disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
US-8507639-B2 Polyamide block polymers containing iodoarylcarboxyl pendant groups and modified poly(meth)acrylamide; coupling; for tracking movement of a catheter through the body or inflation of balloon at site BOSTON SCIENTIFIC SCIMED, INC. (US) 2013-08-13 — — US disclosed
US-8507639-B2 Polyamide block polymers containing iodoarylcarboxyl pendant groups and modified poly(meth)acrylamide; coupling; for tracking movement of a catheter through the body or inflation of balloon at site BOSTON SCIENTIFIC SCIMED, INC. (US) 2013-08-13 — — US disclosed
US-20080064848-A1 Radiopaque amide polymers and medical devices formed thereof BOSTON SCIENTIFIC SCIMED, INC. (US) 2008-03-13 — — US disclosed
US-20080064848-A1 Radiopaque amide polymers and medical devices formed thereof BOSTON SCIENTIFIC SCIMED, INC. (US) 2008-03-13 — — US disclosed
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