SCHEMBL22982377

SCHEMBL22982377

CC(=O)c1cc(I)c(N)c(I)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA5A P35218 1/20 0.46
▸ CA2 P00918 2/20 0.41
▸ CA1 P00915 1/20 0.41
▸ CA9 Q16790 1/20 0.41
▸ TPMT P51580 1/20 0.39
▸ LMNA P02545 4/20 0.39
▸ PRKCI P41743 1/20 0.38
▸ MAPT P10636 3/20 0.36
▸ RAB9A P51151 3/20 0.36
▸ NPC1 O15118 2/20 0.36
▸ CREBBP Q92793 1/20 0.35
▸ CYP2C9 P11712 2/20 0.35
▸ CHRM1 P11229 1/20 0.35
▸ TBXA2R P21731 1/20 0.35
▸ PDE4A P27815 1/20 0.35
▸ ADRA1A P35348 1/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ HIF1A Q16665 1/20 0.35
▸ MTOR P42345 1/20 0.35
▸ NOS3 P29474 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2946706 0.86 CA1 (0.46) CA5ACA2CA1CA9TPMT
SCHEMBL14264012 0.80 TPMT (0.61) CA5ATPMTLMNAMAPTRAB9A
SCHEMBL13624841 0.80 CA5A (0.56) CA5ATPMTLMNAHPGD
SCHEMBL864680 0.78 TPMT (0.65) CA5ACA2CA1CA9TPMT
SCHEMBL14277282 0.78 CA5A (0.48) CA5ATPMTLMNAMAPTRAB9A
SCHEMBL22991601 0.76 CA1 (0.37) CA2CA1CA9TPMTLMNA
SCHEMBL11878620 0.76 CA1 (0.41) CA2CA1CA9TPMTLMNA
SCHEMBL5332682 0.76 HDAC1 (0.47) CA2CA1CA9PRKCIMAPT
SCHEMBL10355104 0.76 CA1 (0.52) CA2CA1CA9TPMTLMNA
SCHEMBL1854564 0.76 PRKCI (0.52) CA5ACA2CA1CA9LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114245792-A Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof 三菱瓦斯化学株式会社 2022-03-25 — — CN disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 — — WO disclosed
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