SCHEMBL13624841

SCHEMBL13624841

CC(=O)c1cc(I)c(O)c(I)c1

nearest known ligand 0.56

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA5A P35218 1/20 0.56
LMNA P02545 2/20 0.52
TTR P02766 2/20 0.50
ESR1 P03372 2/20 0.46
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
HTT P42858 1/20 0.43
TPMT P51580 2/20 0.42
APP P05067 1/20 0.42
ALB P02768 1/20 0.41
CYP2C19 P33261 1/20 0.40
EYA3 Q99504 1/20 0.40
HSD17B1 P14061 1/20 0.39
PKM P14618 1/20 0.38
CYP3A4 P08684 1/20 0.37
HPGD P15428 1/20 0.37
SIRT5 Q9NXA8 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18629882 0.91 CA5A (0.48) CA5ALMNATTRESR1MEN1
SCHEMBL6944075 0.85 LMNA (0.78) CA5ALMNAMEN1KMT2AHTT
SCHEMBL14264012 0.84 TPMT (0.61) CA5ALMNAESR1KMT2ATPMT
SCHEMBL2122707 0.84 SMN1; SMN2 (0.46) CA5ALMNAMEN1KMT2AHTT
SCHEMBL14277282 0.82 CA5A (0.48) CA5ALMNAESR1KMT2ATPMT
SCHEMBL5303103 0.81 TTR (0.52) LMNATTRESR1MEN1KMT2A
SCHEMBL6721288 0.81 TTR (0.52) LMNATTRESR1MEN1KMT2A
SCHEMBL22982377 0.80 CA5A (0.46) CA5ALMNATPMTHPGD
SCHEMBL1613916 0.79 TPMT (0.68) CA5ALMNATTRESR1MEN1
SCHEMBL2163724 0.79 TTR (0.50) LMNATTRESR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
US-11592746-B2 Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid JSR CORPORATION (JP) 2023-02-28 US disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
US-20200341376-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID JSR CORPORATION (JP) 2020-10-29 US disclosed
US-20200341376-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID JSR CORPORATION (JP) 2020-10-29 US disclosed
US-20090291924-A1 Drug design for tubulin inhibitors, compositions, and methods of treatment thereof BIPAR SCIENCES, INC. (US) 2009-11-26 US disclosed
US-20090291924-A1 Drug design for tubulin inhibitors, compositions, and methods of treatment thereof BIPAR SCIENCES, INC. (US) 2009-11-26 US disclosed
US-7538252-B2 Drug design for tubulin inhibitors, compositions, and methods of treatment thereof BIPAR SCIENCES, INC. (US) 2009-05-26 US disclosed
US-7538252-B2 Drug design for tubulin inhibitors, compositions, and methods of treatment thereof BIPAR SCIENCES, INC. (US) 2009-05-26 US disclosed
US-20080076737-A1 DRUG DESIGN FOR TUBULIN INHIBITORS, COMPOSITIONS, AND METHODS OF TREATMENT THEREOF BIPAR SCIENCES, INC. (US) 2008-03-27 US disclosed
US-20080076737-A1 DRUG DESIGN FOR TUBULIN INHIBITORS, COMPOSITIONS, AND METHODS OF TREATMENT THEREOF BIPAR SCIENCES, INC. (US) 2008-03-27 US disclosed
WO-2008030892-A2 DRUG DESIGN FOR TUBULIN INHIBITORS, COMPOSITIONS, AND METHODS OF TREATMENT THEREOF BIPAR SCIENCES, INC. (US) 2008-03-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090291924-A1 Drug design for tubulin inhibitors, compositions, and methods of treatment thereof TUBB, TUBA1C, TUBB1 CA5A 1444/4885LMNA 1792/4885TTR 379/4885
US-20080076737-A1 DRUG DESIGN FOR TUBULIN INHIBITORS, COMPOSITIONS, AND METHODS OF TREATMENT THEREOF TUBB, TUBA1C, TUBB1 CA5A 1444/4885LMNA 1792/4885TTR 379/4885
US-20200341376-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID RER1, TAS1R1, RAD51 CA5A 2014/4885LMNA 3976/4885TTR 4534/4885
US-11592746-B2 Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid RER1, TAS1R1, RAD51 CA5A 2014/4885LMNA 3976/4885TTR 4534/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.