Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MGLL | Q99685 | 2/20 | 0.33 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22872217 | 1.00 | ALDH1A1 (0.34) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL16622154 | 1.00 | ALDH1A1 (0.34) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL142324 | 0.91 | ALDH1A1 (0.40) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL15195722 | 0.91 | ALDH1A1 (0.40) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL19828106 | 0.91 | ALDH1A1 (0.40) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL15856896 | 0.91 | ALDH1A1 (0.40) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| Hydrochloric Acid SCHEMBL31254397 | 0.88 | ALDH1A1 (0.38) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL23287956 | 0.88 | ALDH1A1 (0.43) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL18902677 | 0.87 | — | — | |
| SCHEMBL22872216 | 0.86 | NSD2 (0.33) | ALDH1A1CYP3A4TSHRMAPK1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11731932-B2 | Silicon-containing compositions and their methods of use | ADITYA BIRLA CHEMICALS (USA), INC. (US) | 2023-08-22 | — | — | US | disclosed |
| US-9947480-B2 | Electrolyte material formulation, electrolyte material composition formed therefrom and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2018-04-17 | — | — | US | disclosed |
| US-20170298198-A1 | AROMATIC POLYAMIDE FILMS FOR SOLVENT RESISTANT FLEXIBLE SUBSTRATES | SUMITOMO BAKELITE CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-9691551-B2 | Electrolyte material formulation, electrolyte material composition formed therefrom and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2017-06-27 | — | — | US | disclosed |
| US-20160240321-A1 | ELECTROLYTE MATERIAL FORMULATION, ELECTROLYTE MATERIAL COMPOSITION FORMED THEREFROM AND USE THEREOF | ETERNAL MATERIALS CO., LTD. (TW) | 2016-08-18 | — | — | US | disclosed |
| US-9376560-B2 | Matrix material | HONDA MOTOR CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9039951-B2 | Curable resin composition and short-cure method | CYTEC TECHNOLOGY CORP. (US) | 2015-05-26 | — | — | US | disclosed |
| US-9040225-B2 | Developable bottom antireflective coating composition and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-05-26 | — | — | US | disclosed |
| US-20150050601-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF | GLOBALFOUNDRIES U.S. INC. | 2015-02-19 | — | — | US | disclosed |
| US-20150005458-A1 | MATRIX MATERIAL | HONDA MOTOR CO., LTD. (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140175683-A1 | AROMATIC POLYAMIDE FILMS FOR SOLVENT RESISTANT FLEXIBLE SUBSTRATES | AKRON POLYMER SYSTEMS, INC. (US) | 2014-06-26 | — | — | US | disclosed |
| US-20140154479-A1 | RESIN COMPOSITION FOR PRINTED CIRCUIT BOARD, INSULATING FILM, PREPREG AND PRINTED CIRCUIT BOARD | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2014-06-05 | — | — | US | disclosed |
| US-20140076198-A1 | EPOXY RESIN COMPOSITION FOR INSULATION, INSULATING FILM, PREPREG, AND PRINTED CIRCUIT BOARD | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2014-03-20 | — | — | US | disclosed |
| US-20140072915-A1 | PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-03-13 | — | — | US | disclosed |
| US-20130288178-A1 | PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-31 | — | — | US | disclosed |
| US-20130170103-A1 | ELECTROLYTE MATERIAL FORMULATION, ELECTROLYTE MATERIAL COMPOSITION FORMED THEREFROM AND USE THEREOF | Gemmy Electronic Co., Ltd. (TW) | 2013-07-04 | — | — | US | disclosed |
| US-20130157463-A1 | NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130010403-A1 | ELECTROLYTIC MATERIAL FORMULATION, ELECTROLYTIC MATERIAL COMPOSITION FORMED THEREFROM AND USE THEREOF | Gemmy Electronic Co., Ltd. | 2013-01-10 | — | — | US | disclosed |
| US-7323289-B2 | Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties | BREWER SCIENCE INC. (US) | 2008-01-29 | — | — | US | disclosed |
| US-20070092776-A1 | Sulfonic acid group-containing organic-silica composite membrane and method for producing thereof | EBARA CORPORATION (JP) | 2007-04-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11731932-B2 | Silicon-containing compositions and their methods of use | SRM, REV1, RER1 | ALDH1A1 3388/4885CYP3A4 4618/4885TSHR 4735/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.