SCHEMBL14414917

SCHEMBL14414917

O=S(=O)(O)c1ccccc1-c1nc[nH]n1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PGAM1 P18669 1/20 0.34
▸ MYC P01106 1/20 0.33
▸ TTR P02766 1/20 0.32
▸ TSHR P16473 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ AKR1B1 P15121 1/20 0.31
▸ COMT P21964 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.31
▸ POLB P06746 1/20 0.31
▸ RXFP1 Q9HBX9 1/20 0.31
▸ IDO1 P14902 1/20 0.31
▸ L3MBTL1 Q9Y468 2/20 0.31
▸ DDX3X O00571 1/20 0.31
▸ KDM4A O75164 1/20 0.31
▸ USP2 O75604 1/20 0.31
▸ NSD2 O96028 1/20 0.31
▸ ALPL P05186 1/20 0.31
▸ PLCG1 P19174 1/20 0.31
▸ TNNI3 P19429 1/20 0.31
▸ NFKB1 P19838 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29593594 0.80 CA2 (0.33) TSHRAKR1B1L3MBTL1
SCHEMBL27751597 0.77 EDNRA (0.47) PGAM1MYCTTRTSHRSMN1; SMN2
SCHEMBL458284 0.73 SMN1; SMN2 (0.48) PGAM1MYCTTRTSHRSMN1; SMN2
SCHEMBL1395368 0.73 IDO1 (0.48) TTRTSHRSMN1; SMN2ALDH1A1POLB
SCHEMBL28837581 0.71 SMN1; SMN2 (0.46) PGAM1MYCTTRTSHRSMN1; SMN2
SCHEMBL60327 0.71 SMN1; SMN2 (0.32) TSHRSMN1; SMN2ALDH1A1L3MBTL1
SCHEMBL9173243 0.69 IDO1 (0.47) SMN1; SMN2ALDH1A1POLBRXFP1IDO1
SCHEMBL29721242 0.69 L3MBTL1 (0.33) AKR1B1ALDH1A1IDO1L3MBTL1CASP6
SCHEMBL2593808 0.67 PGAM1 (0.40) PGAM1MYCTTRTSHRSMN1; SMN2
SCHEMBL27914240 0.67 PGAM1 (0.43) PGAM1MYCTTRTSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1837903-B1 Metal polishing slurry and use of said slurry FUJIFILM CORP (JP) 2019-05-01 — — EP disclosed
US-20070224806-A1 Metal polishing slurry FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
US-20070224806-A1 Metal polishing slurry FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
EP-1837903-A2 Metal polishing slurry FUJIFILM Corporation (JP) 2007-09-26 — — EP disclosed
Send feedback