SCHEMBL14452017

SCHEMBL14452017

CCN(CCO)c1ccc(NC(=O)NS(=O)(=O)c2cc(OC)ccc2OC)c(C)c1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.48
LMNA P02545 4/20 0.48
HTT P42858 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
HSD17B10 Q99714 2/20 0.48
ALDH1A1 P00352 4/20 0.48
MAPK1 P28482 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
GFER P55789 1/20 0.48
TP53 P04637 1/20 0.47
GAA P10253 3/20 0.46
L3MBTL3 Q96JM7 1/20 0.46
KDM4E B2RXH2 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.43
RAB9A P51151 2/20 0.43
NPC1 O15118 1/20 0.43
ALOX15 P16050 1/20 0.43
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14452015 0.93 MAPT (0.55) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL14452016 0.90 MAPT (0.46) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL14452018 0.86 MAPT (0.55) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL14470193 0.84 GAA (0.47) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL14470199 0.84 MAPT (0.46) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL14514586 0.82 MAPT (0.48) MAPTSMN1; SMN2ALDH1A1MAPK1NPSR1
SCHEMBL8595225 0.72 MAPT (0.52) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL13650230 0.71 MEN1 (0.59) MAPTLMNAHTTSMN1; SMN2HSD17B10
SCHEMBL8438245 0.71 ALDH1A1 (0.57) MAPTLMNAHTTSMN1; SMN2ALDH1A1
SCHEMBL5960084 0.70 MAPT (0.54) MAPTHTTSMN1; SMN2HSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7250249-B2 Black and white photothermographic material FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed
US-7247421-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-07-24 US disclosed